Unveiling High NA EUV | ASML

The rest of the machine is no less incredible - the EUV light is reflected off a series of mirrors (the largest weighing, IIRC, somewhere in the region of 300kg, and the largest that Zeiss have ever made) onto a mask of the target pattern, which is rapidly shuttling back and forth, onto another series of mirrors, and finally focused onto the wafer stage, which is also moving precisely in step with the mask, to expose the photoresist on a single die which is on the order of 10mm square. And each wafer goes through multiple cycles of this, so not only does the machine rapidly create features at the nanonmetre scale with incredible accuracy, but again and again in exactly the same place after removing and returning the wafer. Oh, and the wafer stage is pretty fun too; it uses an electrostatic chuck that induces a charge in the wafer and therefore holds it firmly in place without needing any kind of suction that could distort the wafer. Promotional fly through video from ASML here: [this video] Asianometry video about the stage: [link] Another short video about the light source: [link]